Nanopantography: A Method for Parallel Writing of Etched and Deposited Nanopatterns

Abstract

Nanopantography is a radically different approach for parallel writing of pre-selected nanopatterns over large areas. Arrays of micro-electrostatic lenses (e.g., small round holes through a metal/insulator structure) on a substrate such as a silicon wafer focus ion beamlets at the bottoms of the holes. When the wafer is tilted, the focal points in each hole are laterally displaced, allowing the focused beamlets to be rastered across the hole bottoms and write patterns in a massively parallel manner. Examples will be given of Si nanoetching and Ni nanodot deposition.