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dc.contributor.authorStokes, Charles Daviden_US
dc.date.accessioned2007-02-09T20:58:38Z
dc.date.available2007-02-09T20:58:38Z
dc.date.issued2000-08en_US
dc.identifier.urihttp://hdl.handle.net/1853/13422
dc.format.extent241 bytes
dc.format.mimetypetext/html
dc.language.isoen_US
dc.publisherGeorgia Institute of Technologyen_US
dc.rightsAccess restricted to authorized Georgia Tech users only.en_US
dc.subject.lcshEtchingen_US
dc.subject.lcshComputer networksen_US
dc.subject.lcshSemiconductorsen_US
dc.titleReal-time monitoring and control of reactive ion etching using neural networksen_US
dc.typeDissertationen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentElectrical and Computer Engineeringen_US
dc.contributor.departmentElectric Engineeringen_US
dc.description.advisorGary S. May
dc.identifier.bibid562772en_US


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