Now showing items 1-2 of 2
Elionix ELS-G100 100 kV Electron Beam Lithography System – Enabling Nanotechnology
(Georgia Institute of Technology, 2020-05-07)
The Elionix ELS-G100 is a direct write electron beam lithography system that uses a 100 kV acceleration voltage and a 1.8 nm spot Gaussian beam to achieve nanometer scale resolution. The Elionix electron beam lithography ...
Electron Beam Lithography Fabricated Carbon Nanofiber Sensor for Water Based Biohazards
(Georgia Institute of Technology, 2009-09-22)
The Nanotechnology Research Center has partnered with Early Warning, Inc. to fabricate a sensor for detection of biohazards in water. The biosensor platform technology has been licensed to Early Warning by NASA and was ...