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Focused Electron Beam Induced Deposition (FEBID) - A New Tool for 3-D Nanomanufacturing
(Georgia Institute of Technology, 2011-01-25)
In FEBID a tightly-focused, high-energy electron beam impinges on a substrate and, upon collision interactions, producing
lower energy back-scattered (BSE) primary electrons and secondary electrons (SE). Concurrently, the ...
Etching 3D nanostructures in Silicon using Metal-assisted Chemical Etching
(Georgia Institute of Technology, 2011-04-12)
Metal-assisted Chemical Etching (MaCE) of silicon is a new method to fabricate complex 1D, 2D and 3D silicon nanostructures. In this process, silicon etching is confined to a small region surrounding metal catalyst ...
Fabrication of TiO2 Nano-fiber Meshes by Electrospinning and Evaluation of their Potential for Bone Applications
(Georgia Institute of Technology, 2011-04-12)
Ideal outcomes in the field of tissue engineering and regenerative medicine involve biomaterials that can enhance cell
differentiation and tissue repair without the use of systemic drugs. Tissue engineering biomaterials ...
Photolithography at GT-IEN: An Overview of Processes and Equipment
(Georgia Institute of Technology, 2020-05-14)
Photolithography has always been the most important technique in microelectronics fabrication. It uses light to transfer a geometric pattern from a photomask (also called an optical mask) to a photosensitive (that is, ...
Elionix ELS-G100 100 kV Electron Beam Lithography System – Enabling Nanotechnology
(Georgia Institute of Technology, 2020-05-07)
The Elionix ELS-G100 is a direct write electron beam lithography system that uses a 100 kV acceleration voltage and a 1.8 nm spot Gaussian beam to achieve nanometer scale resolution. The Elionix electron beam lithography ...
Plasma Etching: An Overview of Equipment and Processing at IEN
(Georgia Institute of Technology, 2020-05-28)
Etching is one of the fundamental building blocks of microelectronic fabrication. Removing material through chemical or physical means is an essential skill found in most microelectronics laboratories. The Institute for ...
Wire-bonding Overview and Packaging Toolsets at Georgia Tech IEN
(Georgia Institute of Technology, 2020-06-11)
The shared user labs within the Institute for Electronics and Nanotechnology at Georgia Tech include an electronics packaging toolset. A brief overview of assembly and interconnection toolsets and technologies available ...
Fundamentals of Photomask Design
(Georgia Institute of Technology, 2020-06-18)
The creation of a photomask set is the first step to producing any variety of semiconductor devices. Thinking through how each mask will be used and the processing steps around them will ensure a smoother process flow and ...
Subtractive Etching of Cu with Hydrogen-Based Plasmas
(Georgia Institute of Technology, 2011-02-22)
Beginning at the 130 nm node, copper (Cu) interconnection layers were introduced to replace conventional Al layers in order to reduce the wiring
resistance in logic devices. Due to the inability to form volatile etch ...
III-V Nitride Based Micro and Nanoscale Sensors
(Georgia Institute of Technology, 2011-03-08)
Structural, mechanical, and sensing properties of InN nanowires (NWs) grown by chemical vapor deposition process have been
investigated for their applications in nanoscale sensors. It has been observed that the NWs bend ...