Now showing items 1-5 of 5
Photolithography at GT-IEN: An Overview of Processes and Equipment
(Georgia Institute of Technology, 2020-05-14)
Photolithography has always been the most important technique in microelectronics fabrication. It uses light to transfer a geometric pattern from a photomask (also called an optical mask) to a photosensitive (that is, ...
Elionix ELS-G100 100 kV Electron Beam Lithography System – Enabling Nanotechnology
(Georgia Institute of Technology, 2020-05-07)
The Elionix ELS-G100 is a direct write electron beam lithography system that uses a 100 kV acceleration voltage and a 1.8 nm spot Gaussian beam to achieve nanometer scale resolution. The Elionix electron beam lithography ...
Plasma Etching: An Overview of Equipment and Processing at IEN
(Georgia Institute of Technology, 2020-05-28)
Etching is one of the fundamental building blocks of microelectronic fabrication. Removing material through chemical or physical means is an essential skill found in most microelectronics laboratories. The Institute for ...
Wire-bonding Overview and Packaging Toolsets at Georgia Tech IEN
(Georgia Institute of Technology, 2020-06-11)
The shared user labs within the Institute for Electronics and Nanotechnology at Georgia Tech include an electronics packaging toolset. A brief overview of assembly and interconnection toolsets and technologies available ...
Fundamentals of Photomask Design
(Georgia Institute of Technology, 2020-06-18)
The creation of a photomask set is the first step to producing any variety of semiconductor devices. Thinking through how each mask will be used and the processing steps around them will ensure a smoother process flow and ...