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Elionix ELS-G100 100 kV Electron Beam Lithography System – Enabling Nanotechnology
(Georgia Institute of Technology, 2020-05-07)
The Elionix ELS-G100 is a direct write electron beam lithography system that uses a 100 kV acceleration voltage and a 1.8 nm spot Gaussian beam to achieve nanometer scale resolution. The Elionix electron beam lithography ...