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dc.contributor.authorLudden, John Michaelen_US
dc.date.accessioned2007-07-27T11:34:00Z
dc.date.available2007-07-27T11:34:00Z
dc.date.issued1992-12en_US
dc.identifier.urihttp://hdl.handle.net/1853/15879
dc.publisherGeorgia Institute of Technologyen_US
dc.rightsAccess restricted to authorized Georgia Tech users only.en_US
dc.subject.lcshSilicon carbideen_US
dc.subject.lcshVapor-platingen_US
dc.subject.lcshChemical reactorsen_US
dc.titleSimulation of a cylindrical CVD reactor for deposition of silicon carbideen_US
dc.typeThesisen_US
dc.description.degreeM.S.en_US
dc.contributor.departmentMechanical engineeringen_US
dc.description.advisorDavid L. McDowellen_US
dc.identifier.bibid364076en_US


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