Electrochemical Atomic Layer Deposition (ALD)

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dc.contributor.author Stickney, John L.
dc.date.accessioned 2009-03-10T19:47:44Z
dc.date.available 2009-03-10T19:47:44Z
dc.date.issued 2009-02-24
dc.identifier.uri http://hdl.handle.net/1853/27238
dc.description John Stickney, Professor of Chemistry and Department Head of Chemistry at the University of Georgia, presented a lecture at the Nano@Tech Meeting on February 24, 2009 at 12 noon in room 102 of the Microelectronics Research Center. en
dc.description Runtime: 73:20 minutes
dc.description.abstract Recent results in studies of the formation of compound and metal nanofilms by electrochemical atomic layer deposition (ALD) will be discussed. ALD is the deposition of materials an atomic layer at a time using surface limited reactions. Electrochemical surface limited reactions are generally referred to as underpotential deposition or UPD. By combining UPD and ALD, electrochemical ALD is created. Historically most electrochemical ALD has been performed in the creation of compound semiconductor thin films. More recently a number of elemental deposits have been formed by electrochemical ALD, and a surface limited reaction referred to here as a surface limited redox replacement or SLRR. Recent work on the formation of compound for photovoltaics, thermoelectrics, and for phase change memory may be discussed. In addition, recent work on the growth of Pt and Ru nanofilms for fuel cell electrodes may be described. Deposit characterization involves electron beam microprobe analysis (EPMA) for deposit stoichiometry. Glancing angle X-ray diffraction for structural characterization, while scanning tunneling microscopy (STM) was used to characterize the surface morphology. Optical characterization involves reflection absorption studies as well as photoelectrochemical studies. Optimization studies involve systematic investigation of the conditions which result in the formation of one compound or elemental monolayer with each deposition cycle. In general, deposits formed at a rate of one monolayer per cycle or less show the best structure, stoichiometry and morphology. Nano templates can be used to form nanoclusters, rods or wires, depending on the number of cycles performed. Superlattices can be formed by alternating some finite number of cycles for the growth of one compound with a similar number of cycles of another. X-ray diffraction can then be used to characterize the period of the superlattice. en
dc.format.extent 73:20 minutes
dc.language.iso en_US en
dc.publisher Georgia Institute of Technology en
dc.subject Nanotechnology en
dc.subject ALD en
dc.subject Atomic layer deposition en
dc.subject Electrodeposition en
dc.subject Nanofilm en
dc.subject Surface science en
dc.title Electrochemical Atomic Layer Deposition (ALD) en
dc.type Lecture en
dc.type Video
dc.contributor.corporatename University of Georgia

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