Development of Porous Silicon Microfilters

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Please use this identifier to cite or link to this item: http://hdl.handle.net/1853/28119

Title: Development of Porous Silicon Microfilters
Author: Campbell, Jenna
Abstract: This study develops a one-step anodization separation process (OSS) after examining two step and multi step liftoff procedures in which porous silicon (PS) films lift off from their substrates. This lift-off process provides a means to produce silicon filters, a worthy alternative to alumina filters that cannot withstand high temperatures as well as silicon and whose pore diameter has yet to reach into the order of microns. By electrochemical etching of p-type silicon wafers in a hydrofluoric acid-based solution, microporous filters with pore diameters varying from 1 to 2 microns whose depths range from 3 to 70 micrometers are fabricated. Using wafers with a resistivity of 14-22 Ω-cm, mobile filters with consistent structural qualities can be reproduced.
Type: Undergraduate Thesis
URI: http://hdl.handle.net/1853/28119
Date: 2009-05-04
Publisher: Georgia Institute of Technology
Subject: Porous silicon
Micro/nano films
Active
Lift-off
Filter
Department: Physics
Advisor: James Gole - Faculty Mentor ; Edward Conrad - Committee Member/Second Reader

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