Phase transitions, curve evolution, and the control of semiconductor manufacturing processes
Berg, Jordan M.
Tannenbaum, Allen R.
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This paper presents a strategy for the estimation and control of certain semiconductor manufacturing processes, employing models developed to describe the dynamics of material interfaces in phase transition problems. Previous work has successfully applied similar models to predict surface evolution in etching and deposition. Here, we propose to adapt these techniques to real-time process monitoring and control. The testbed for algorithm development is a highly simplified model of a plasma etch. Key elements of the scheme are investigated, and found to be feasible.