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dc.contributor.authorLackey, W. Jacken_US
dc.contributor.authorWang, Zhongen_US
dc.contributor.authorFedorov, Andreien_US
dc.contributor.authorOrlando, Thomasen_US
dc.date.accessioned2012-02-01T17:27:45Z
dc.date.available2012-02-01T17:27:45Z
dc.date.issued2011-09-22en_US
dc.identifier.other10885en_US
dc.identifier.urihttp://hdl.handle.net/1853/42344
dc.descriptionIssued as final reporten_US
dc.description.sponsorshipNational Science Foundation (U.S.)en_US
dc.publisherGeorgia Institute of Technologyen_US
dc.relation.ispartofseriesSchool of Mechanical Engineering ; Project no. 97347en_US
dc.titleNIRT: Electron beam chemical vapor deposition (CVD) - a new tool for manufacturing nanomaterials and devicesen_US
dc.typeTechnical Reporten_US
dc.contributor.corporatenameGeorgia Institute of Technology. Office of Sponsored Programsen_US
dc.contributor.corporatenameGeorgia Institute of Technology. School of Mechanical Engineeringen_US
dc.contributor.corporatenameGeorgia Institute of Technology. Office of Sponsored Programs


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