Now showing items 1-2 of 2
Pattern-integrated interference lithography instrumentation
(Georgia Institute of Technology, 2012-06)
Multi-beam interference (MBI) provides the ability to form a wide range of sub-micron periodic optical-intensity distributions with applications to a variety of areas, including photonic crystals (PCs), nanoelectronics, ...
Three-beam interference lithography methodology
(Georgia Institute of Technology, 2011-02)
Three-beam interference lithography represents a technology capable of producing two-dimensional periodic structures for applications such as micro- and nanoelectronics, photonic crystal devices, metamaterial devices, ...