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    Comparison of positive tone versus negative tone resist pattern collapse behavior 

    Yeh, Wei-Ming; Noga, David E.; Lawson, Richard A.; Tolbert, Laren M.; Henderson, Clifford L. (Georgia Institute of Technology, 2010-11)
    In this work, e-beam lithography patterns have been specifically designed and fabricated which provide the opportunity to probe the collapse behavior of both positive and negative tone systems. The pattern layout includes ...

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    Author
    Henderson, Clifford L. (1)
    Lawson, Richard A. (1)
    Noga, David E. (1)
    Tolbert, Laren M. (1)Yeh, Wei-Ming (1)Subject
    Electron resists (1)
    Polymer blends (1)
    Polymer films (1)
    ... View MoreDate Issued
    2010 (1)
    Has File(s)Yes (1)
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