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dc.contributor.authorStay, Justin L.en_US
dc.contributor.authorGaylord, Thomas K.en_US
dc.date.accessioned2012-11-05T20:56:06Z
dc.date.available2012-11-05T20:56:06Z
dc.date.issued2008-07
dc.identifier.citationStay, Justin L. and Gaylord, Thomas K., "Contrast in four-beam-interference lithography," Optics Letters, 33, 13, 1434-1436 (July 1 2008)en_US
dc.identifier.issn0146-9592
dc.identifier.urihttp://hdl.handle.net/1853/45244
dc.description© 2008 Optical Society of Americaen_US
dc.descriptionThe definitive version of this paper is available at: http://dx.doi.org/10.1364/OL.33.001434en_US
dc.descriptionDOI: 10.1364/OL.33.001434en_US
dc.description.abstractSpecific configurations of four linearly polarized, monochromatic plane waves have previously been shown to be capable of producing interference patterns exhibiting the symmetries inherent in all 14 Bravais lattices. We present (1) the range of possible absolute contrasts, (2) the conditions for unity absolute contrast, and (3) the types of interference patterns possible for configurations of four beams interference that satisfy the uniform contrast condition. Results are presented for three Bravais lattice structures: Base- and face-centered cubic and simple cubic.en_US
dc.language.isoen_USen_US
dc.publisherGeorgia Institute of Technologyen_US
dc.subjectDiffraction gratingsen_US
dc.subjectPhotonic crystalsen_US
dc.subjectMicrolithographyen_US
dc.subjectNanolithographyen_US
dc.subjectNanophotonicsen_US
dc.titleContrast in four-beam-interference lithographyen_US
dc.typeArticleen_US
dc.contributor.corporatenameGeorgia Institute of Technology. Center for Organic Photonics and Electronicsen_US
dc.contributor.corporatenameGeorgia Institute of Technology. School of Electrical and Computer Engineeringen_US
dc.publisher.originalOptical Society of Americaen_US
dc.identifier.doi10.1364/OL.33.001434


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