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dc.contributor.authorHaske, Wojciechen_US
dc.contributor.authorChen, Vincent W.en_US
dc.contributor.authorHales, Joel M.en_US
dc.contributor.authorDong, Wentingen_US
dc.contributor.authorBarlow, Stephenen_US
dc.contributor.authorMarder, Seth R.en_US
dc.contributor.authorPerry, Joseph W.en_US
dc.date.accessioned2012-11-06T21:02:56Z
dc.date.available2012-11-06T21:02:56Z
dc.date.issued2007-03
dc.identifier.citationHaske, Wojciech and Chen, Vincent W. and Hales, Joel M. and Dong, Wenting and Barlow, Stephen and Marder, Seth R. and Perry, Joseph W., "65 nm feature sizes using visible wavelength 3-D multiphoton lithography," Optics Express, 15, 6, 3426-3436 (March 19 2007)en_US
dc.identifier.issn1094-4087
dc.identifier.urihttp://hdl.handle.net/1853/45269
dc.description© 2007 Optical Society of Americaen_US
dc.descriptionThe definitive version of this paper is available at: http://dx.doi.org/10.1364/OE.15.003426en_US
dc.descriptionDOI: 10.1364/OE.15.003426en_US
dc.description.abstractNanoscale features as small as 65 ± 5 nm have been formed reproducibly by using 520 nm femtosecond pulsed excitation of a 4,4'- bis(di-n-butylamino)biphenyl chromophore to initiate crosslinking in a triacrylate blend. Dosimetry studies of the photoinduced polymerization were performed on chromophores with sizable two-photon absorption crosssections at 520 and 730 nm. These studies show that sub-diffraction limited line widths are obtained in both cases with the lines written at 520 nm being smaller. Three-dimensional multiphoton lithography at 520 nm has been used to fabricate polymeric woodpile photonic crystal structures that show stop bands in the near-infrared spectral region.en_US
dc.language.isoen_USen_US
dc.publisherGeorgia Institute of Technologyen_US
dc.subjectLithographyen_US
dc.subjectMultiphoton processesen_US
dc.subjectLaserinduced chemistryen_US
dc.subjectPhotonic bandgap materialsen_US
dc.subjectNanofabricationen_US
dc.title65 nm feature sizes using visible wavelength 3-D multiphoton lithographyen_US
dc.typeArticleen_US
dc.contributor.corporatenameGeorgia Institute of Technology. Center for Organic Photonics and Electronicsen_US
dc.publisher.originalOptical Society of Americaen_US
dc.identifier.doi10.1364/OE.15.003426


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