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dc.contributor.authorStay, Justin L.en_US
dc.contributor.authorGaylord, Thomas K.en_US
dc.date.accessioned2012-11-16T21:01:02Z
dc.date.available2012-11-16T21:01:02Z
dc.date.issued2008-06
dc.identifier.citationStay, Justin L. and Gaylord, Thomas K., "Three-beam-interference lithography: contrast and crystallography," Applied Optics, 47, 18, 3221-3230 (June 20 2008)en_US
dc.identifier.issn0003-6935
dc.identifier.urihttp://hdl.handle.net/1853/45413
dc.description© 2008 Optical Society of America. The definitive version of this paper is available at: http://dx.doi.org/10.1364/AO.47.003221en_US
dc.descriptionDOI: 10.1364/AO.47.003221en_US
dc.description.abstractSpecific configurations of three linearly polarized, monochromatic plane waves have previously been shown to be capable of producing interference patterns exhibiting symmetry inherent in 5 of the 17 plane groups. Starting with the general expression for N linearly polarized waves, three-beam interference is examined in detail. The totality of all possible sets of constraints for producing the five plane groups is presented. In addition, two uniform contrast conditions are identified and discussed. Further, it is shown that when either of the uniform contrast conditions is applied and the absolute contrast is maximized, unity absolute contrast is achievable.en_US
dc.language.isoen_USen_US
dc.publisherGeorgia Institute of Technologyen_US
dc.subjectDiffraction gratingsen_US
dc.subjectImaging systemsen_US
dc.subjectMicrolithographyen_US
dc.subjectOptical design and fabricationen_US
dc.subjectLithographyen_US
dc.subjectImaging systemsen_US
dc.subjectNanolithographyen_US
dc.subjectOpticsen_US
dc.subjectNanophotonicsen_US
dc.subjectPhotonic crystalsen_US
dc.titleThree-beam-interference lithography: contrast and crystallographyen_US
dc.typeArticleen_US
dc.contributor.corporatenameGeorgia Institute of Technology. Center for Organic Photonics and Electronicsen_US
dc.contributor.corporatenameGeorgia Institute of Technology. School of Electrical and Computer Engineeringen_US
dc.publisher.originalOptical Society of Americaen_US
dc.identifier.doi10.1364/AO.47.003221


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