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dc.contributor.authorBurrow, Guy M.en_US
dc.contributor.authorLeibovici, Matthieu C. R.en_US
dc.contributor.authorKummer, J. W.en_US
dc.contributor.authorGaylord, Thomas K.en_US
dc.date.accessioned2012-12-17T15:57:54Z
dc.date.available2012-12-17T15:57:54Z
dc.date.issued2012-06
dc.identifier.citationBurrow, G. M. and Leibovici, M. C. R. and Kummer, J. W. and Gaylord, T. K., "Pattern-integrated interference lithography instrumentation," Review of Scientific Instruments, 83, 6, (June 2012).en_US
dc.identifier.issn0034-6748 (print)
dc.identifier.issn1089-7623 (online)
dc.identifier.urihttp://hdl.handle.net/1853/45576
dc.description© 2012 American Institute of Physics. The electronic version of this article is the complete one and can be found at: http://dx.doi.org/10.1063/1.4729666|DOI: 10.1063/1.4729666en_US
dc.description.abstractMulti-beam interference (MBI) provides the ability to form a wide range of sub-micron periodic optical-intensity distributions with applications to a variety of areas, including photonic crystals (PCs), nanoelectronics, biomedical structures, optical trapping, metamaterials, and numerous subwavelength structures. Recently, pattern-integrated interference lithography (PIIL) was presented as a new lithographic method that integrates superposed pattern imaging with interference lithography in a single-exposure step. In the present work, the basic design and systematic implementation of a pattern-integrated interference exposure system (PIIES) is presented to realize PIIL by incorporating a projection imaging capability in a novel three-beam interference configuration. A fundamental optimization methodology is presented to model the system and predict MBI-patterning performance. To demonstrate the PIIL method, a prototype PIIES experimental configuration is presented, including detailed alignment techniques and experimental procedures. Examples of well-defined PC structures, fabricated with a PIIES prototype, are presented to demonstrate the potential of PIIL for fabricating dense integrated optical circuits, as well as numerous other subwavelength structures.en_US
dc.language.isoen_USen_US
dc.publisherGeorgia Institute of Technologyen_US
dc.subjectIntegrated opticsen_US
dc.subjectInterference suppressionen_US
dc.subjectLight interferenceen_US
dc.subjectOptical fabricationen_US
dc.subjectOptimisationen_US
dc.subjectPhotolithographyen_US
dc.subjectPhotonic crystalsen_US
dc.titlePattern-integrated interference lithography instrumentationen_US
dc.typeArticleen_US
dc.contributor.corporatenameGeorgia Institute of Technology. Center for Organic Photonics and Electronicsen_US
dc.contributor.corporatenameGeorgia Institute of Technology. School of Electrical and Computer Engineering
dc.publisher.originalAmerican Institute of Physicsen_US
dc.identifier.doi10.1063/1.4729666en_US


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