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dc.contributor.authorLawson, Richard A.en_US
dc.contributor.authorHenderson, Clifford L.en_US
dc.date.accessioned2012-12-17T21:15:09Z
dc.date.available2012-12-17T21:15:09Z
dc.date.issued2010-01
dc.identifier.citationLawson, Richard A. and Henderson, Clifford L., "Mesoscale kinetic Monte Carlo simulations of molecular resists: effects of photoacid homogeneity on resolution, line-edge roughness, and sensitivity," Journal of Micro-Nanolithography MEMS and MOEMS, 9, 1 (January-March 2010)en_US
dc.identifier.issn1932-5150
dc.identifier.urihttp://hdl.handle.net/1853/45586
dc.description©2010 SPIE--The International Society for Optical Engineering. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited. The electronic version of this article is the complete one and can be found online at: http://dx.doi.org/10.1117/1.3358383en_US
dc.descriptionDOI: 10.1117/1.3358383en_US
dc.description.abstractA 2-D kinetic Monte Carlo mesoscale model of molecular resists is developed to probe the effects of photoacid (PAG) homogeneity, specifically PAG aggregation behavior, on the resolution, sensitivity, and line-edge roughness (LER) performance of resists. The model reproduces many pattern defects that are commonly found experimentally by simply increasing the amount of PAG aggregation. The sensitivity of resists is found to change with increasing PAG aggregation in resists with low photoacid diffusivity, but remains near constant for resists with high photoacid diffusivity. Likewise, LER is found to increase with increasing PAG aggregation in resists with low photoacid diffusivity, but appears to be weakly dependent on PAG aggregation when the resist has high photoacid diffusivity. Increasing PAG aggregation limits the absolute resolution of a resist, because there exists a trade-off between the ability of photoacid diffusion to smooth out the inhomogeneity due to PAG aggregation and the blurring of the patterned feature that reduces resolution. Even very low levels of PAG aggregation appear to greatly limit the potential of a resist for sub-30-nm resolution patterning, but increased PAG loading appears to provide a way to mitigate this problem and allow for improved absolute resolution, even in the presence of aggregation.en_US
dc.language.isoen_USen_US
dc.publisherGeorgia Institute of Technologyen_US
dc.subjectChemically amplified photoresisten_US
dc.subjectMesoscale modelen_US
dc.subjectStochastic modelen_US
dc.subjectResolutionen_US
dc.subjectSensitivityen_US
dc.subjectLine edge roughnessen_US
dc.subjectPhotoacid generatoren_US
dc.subjectHomogeneityen_US
dc.subjectAggregationen_US
dc.titleMesoscale kinetic Monte Carlo simulations of molecular resists: effects of photoacid homogeneity on resolution, line-edge roughness, and sensitivityen_US
dc.typeArticleen_US
dc.contributor.corporatenameGeorgia Institute of Technology. Center for Organic Photonics and Electronicsen_US
dc.contributor.corporatenameGeorgia Institute of Technology. School of Chemical and Biomolecular Engineeringen_US
dc.publisher.originalSociety of Photo-optical Instrumentation Engineers (SPIE)en_US
dc.identifier.doi10.1117/1.3358383


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