Ink-jet Deposition for Direct Write Patterning

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Title: Ink-jet Deposition for Direct Write Patterning
Author: Gottfried, David
Abstract: Deposition of micrometer scale fluid materials on surfaces with controlled volume, area, and position accuracy is a common need for development and application of many microelectronics, MEMS, and optical devices. While approaches include top-down (photo and nanolithography, nanoimprinting) and bottom-up (microcontact printing, dip pen nanolithography) methods, the simplicity, precision, and speed of ink-jet printing technology makes it well-suited for both laboratory research and manufacturing. In the last decade, ink-jet has come to be viewed as a precision microdispensing tool, in addition to its huge success in color printing. Ink-jet patterning is data-driven, non-contact, and is capable of precise deposition of picoliter volumes at high rates, even onto non-planar surfaces. As an additive process, ink-jet deposition can minimize the use of expensive ink materials such as DNA, light-emitting polymers and precious metals. This seminar will provide an overview of current inkjet technology and some typical applications, drawing on the resources available at the IEN and the research of its many users.
Description: David Gottfried presented a lecture at the Nano@Tech Meeting on November 27, 2012 at 12 noon in room 1116 of the Marcus Nanotechnology Building. David Gottfried received a B.S. in chemistry from the University of Michigan and continued his studies in physical chemistry at Stanford University, obtaining his doctorate in 1991. After a post-doctoral fellowship at the Weizmann Institute of Science/Bar-Ilan University, he began research and teaching in biophysics at the Albert Einstein College of Medicine. In 1999 he moved to the Georgia Tech Research Institute where he designed and tested optical sensors for chemical and biological agents with food safety, environmental, and homeland security applications. Dr. Gottfried joined the Nanotechnology Research Center(a member center of the Institute for Electronics and Nanotechnology) in 2007 where he is a domain expert/technical liaison as part of the National Nanotechnology Infrastructure Network. Dr. Gottfried was selected as an ACS Fellow in 2012. Runtime: 57:31 minutes
Type: Lecture
Date: 2012-11-27
Contributor: Georgia Institute of Technology. Microelectronics Research Center
Georgia Institute of Technology. Nanotechnology Research Center
Georgia Institute of Technology. Institute for Electronics and Nanotechnology
Publisher: Georgia Institute of Technology
Subject: Fabrication

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