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dc.contributor.authorOgunsola, O. O.en_US
dc.contributor.authorThacker, H. D.en_US
dc.contributor.authorBachim, B. L.en_US
dc.contributor.authorBakir, M. S.en_US
dc.contributor.authorPikarsky, J.en_US
dc.contributor.authorGaylord, Thomas K.en_US
dc.contributor.authorMeindl, J. D.en_US
dc.date.accessioned2013-06-27T19:45:03Z
dc.date.available2013-06-27T19:45:03Z
dc.date.issued2006-07
dc.identifier.citationOgunsola, O. O.; Thacker, H. D.; Bachim, B. L.; Bakir, M. S.; Pikarsky, J.; Gaylord, Thomas K. and Meindl, J. D., "Chip-level waveguide-mirror-pillar optical interconnect structure," IEEE Photonics Technology Letters, Vol. 18, no.15-16, pp.1672-1674 (Aug 2006).en_US
dc.identifier.issn1041-1135 (print)
dc.identifier.urihttp://hdl.handle.net/1853/48111
dc.description© 2006 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.en_US
dc.description.abstractWaveguides, mirrors, and polymer pillars can be integrated together to provide optical interconnects to the chip level. Total internal reflection in the polymer pillar provides a high level of spatial confinement of the light. The metallized mirror terminating the waveguide may be at 45 or at a nearby angle such as 54.74 (anisotropically etched silicon) and produce nearly equal coupling efficiencies. For a polymer waveguide, a gold mirror, and a polymer pillar of the dimensions fabricated, the simulated coupling efficiencies are 80.7% or 0.93 dB (45 mirror) and 82.5% or 0.84 dB (54.74 mirror), respectively. These simulations together with the fabrication and testing of a 54.74 mirror configuration demonstrates the viability of the waveguide-mirror-pillar structure, its insensitivity to mirror angle, and its compatibility with current substrate fabrication technologies.en_US
dc.language.isoen_USen_US
dc.publisherGeorgia Institute of Technologyen_US
dc.subjectFinite-difference time-domain (FDTD)en_US
dc.subjectMirrorsen_US
dc.subjectOptical interconnectsen_US
dc.subjectOptical waveguidesen_US
dc.subjectPolymer pillarsen_US
dc.titleChip-level waveguide-mirror-pillar optical interconnect structureen_US
dc.typeArticleen_US
dc.contributor.corporatenameGeorgia Institute of Technology. Center for Organic Photonics and Electronicsen_US
dc.publisher.originalInstitute of Electrical and Electronics Engineersen_US
dc.identifier.doi10.1109/LPT.2006.879533en_US


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