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dc.contributor.advisorDas, Suman
dc.contributor.advisorJacob, Karl
dc.contributor.authorAlabi, Taiwo Raphael
dc.date.accessioned2014-05-09T13:40:24Z
dc.date.available2014-05-09T13:40:24Z
dc.date.issued2013-03-29
dc.identifier.urihttp://hdl.handle.net/1853/51709
dc.description.abstractSilicon and silicon-based materials have been investigated for the fabrication of electronic, optoelectronic, solar, and structural/mechanical devices. To enable the continuous use of silicon-based materials for next generation device applications, new and inexpensive ways of fabricating features of silicon, and silica-based materials are needed. This dissertation investigates: 1) novel techniques for the fabrication of silica and silicon nanofeatures with potential application in the electronics and optoelectronics industry; 2) new designs of photomodifiable material systems (resists) for maskless patterning of silica filled composites for structural/mechanical applications. Sub-micron and nano-scaled features were fabricated onto silicon and silicon oxide substrates using a technique combining block copolymers and laser interference ablation. The sacrificial block copolymers are loaded with metallic salt precursors and patterned with a UV laser to generate device-oriented nanofeatures. New photopolymerizable material systems (negative tone resists) were developed based on curcumin photosensitizer and an epoxy-acrylate, vinylether, and vinylether-acrylate silica¬-loaded material systems. The cationic and radical mechanisms employed by the monomeric systems under a high vapor pressure mercury lamp source were investigated with several materials characterization techniques.en_US
dc.language.isoen_USen_US
dc.publisherGeorgia Institute of Technologyen_US
dc.subjectReactive ion etchingen_US
dc.subjectPositive tone resisten_US
dc.subjectSilicon nanowiresen_US
dc.subjectBlock copolymersen_US
dc.subjectLaser interference ablationen_US
dc.subjectNegative tone resisten_US
dc.subject.lcshSilicon compounds
dc.subject.lcshPhotoresists
dc.subject.lcshMasks (Electronics)
dc.subject.lcshPhotopolymerization
dc.titleDesign of photomodifiable material systems for maskless patterning of functional ceramic and metallic materials at multiple length scalesen_US
dc.typeDissertationen_US
dc.description.degreePh.D.
dc.contributor.departmentPolymer, Textile and Fiber Engineering
dc.embargo.termsnullen_US
thesis.degree.departmentMaterials Science and Engineering
thesis.degree.levelDoctoral
dc.contributor.committeeMemberGriffin, Anselm
dc.contributor.committeeMemberBucknall, David
dc.contributor.committeeMemberBeckham, Haskell W.


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