On the effects of total ionizing dose in silicon-germanium BiCMOS platforms
Fleetwood, Zachary E.
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The objective of the proposed research is to analyze the effects of total ionizing dose (TID) on highly scaled CMOS and Silicon-Germanium Heterojunction Bipolar Transistors (SiGE HBTs). TID damage is caused by a build-up of charge at sensitive Si-SiO₂ interfaces and may cause device or circuit failure. TID damage is due to an accumulation of radiation particle strikes seen in extreme environments, such as space.