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dc.contributor.authorMays, Ebony Lynnen_US
dc.date.accessioned2005-03-10T18:45:47Z
dc.date.available2005-03-10T18:45:47Z
dc.date.issued2003-12-01en_US
dc.identifier.urihttp://hdl.handle.net/1853/5422
dc.format.extent11424382 bytes
dc.format.mimetypeapplication/pdf
dc.language.isoen_US
dc.publisherGeorgia Institute of Technologyen_US
dc.subjectZirconium alloys Analysisen_US
dc.subjectThin films
dc.subjectChemical vapor deposition
dc.subjectDielectrics
dc.subject.lcshZirconium alloys Analysisen_US
dc.subject.lcshThin filmsen_US
dc.subject.lcshDielectricsen_US
dc.subject.lcshChemical vapor depositionen_US
dc.titleChemical vapor deposition and characterization of zirconium tin titanate as a high dielectric constant material for potential electronic applicationsen_US
dc.typeDissertationen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMaterials Science and Engineeringen_US
dc.description.advisorCommittee Chair: Meilin Liuen_US


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