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    Optical interferometric determination of in-plane residual stresses in SiO₂ films on silicon substrates

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    e-25-564_457618.pdf (3.955Mb)
    Date
    1994-04
    Author
    Danyluk, Steven S.
    Ghaffari, Kasey
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    URI
    http://hdl.handle.net/1853/55095
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    • Office of Sponsored Programs Research Reports [6426]

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