| dc.contributor.author | Kostamo, Juhana | |
| dc.date.accessioned | 2017-05-09T17:24:22Z | |
| dc.date.available | 2017-05-09T17:24:22Z | |
| dc.date.issued | 2017-04-26 | |
| dc.identifier.uri | http://hdl.handle.net/1853/56687 | |
| dc.description | Presented on April 26, 2017 at 12:45 p.m. in the Marcus Nanotechnology Building, room 1116. | en_US |
| dc.description | Juhana Kostamo is the PIcosun Managing Directory. He presented Session 4: New Development in ALD on behalf of Erik Ostreng. | en_US |
| dc.description | Runtime: 60:32 minutes | en_US |
| dc.format.extent | 60:32 minutes | |
| dc.language.iso | en_US | en_US |
| dc.relation.ispartofseries | IEN Industry Seminar Series: Industrial Applications of Atomic Layer Deposition | en_US |
| dc.subject | Atomic layer deposition | en_US |
| dc.subject | Picosun | en_US |
| dc.title | New Development in ALD: Session 4 | en_US |
| dc.type | Presentation | en_US |
| dc.type | Video | en_US |
| dc.contributor.corporatename | Georgia Institute of Technology. Institute for Electronics and Nanotechnology | en_US |
| dc.contributor.corporatename | Picosun Oy | en_US |
