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dc.contributor.authorKostamo, Juhana
dc.date.accessioned2017-05-09T17:24:22Z
dc.date.available2017-05-09T17:24:22Z
dc.date.issued2017-04-26
dc.identifier.urihttp://hdl.handle.net/1853/56687
dc.descriptionPresented on April 26, 2017 at 12:45 p.m. in the Marcus Nanotechnology Building, room 1116.en_US
dc.descriptionJuhana Kostamo is the PIcosun Managing Directory. He presented Session 4: New Development in ALD on behalf of Erik Ostreng.en_US
dc.descriptionRuntime: 60:32 minutesen_US
dc.format.extent60:32 minutes
dc.language.isoen_USen_US
dc.relation.ispartofseriesIEN Industry Seminar Series: Industrial Applications of Atomic Layer Depositionen_US
dc.subjectAtomic layer depositionen_US
dc.subjectPicosunen_US
dc.titleNew Development in ALD: Session 4en_US
dc.typePresentationen_US
dc.typeVideoen_US
dc.contributor.corporatenameGeorgia Institute of Technology. Institute for Electronics and Nanotechnologyen_US
dc.contributor.corporatenamePicosun Oyen_US


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