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    Technique For Producing Antireflection Grating Surfaces On Dielectrics, Semiconductors And Metals

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    5007708.pdf (1.764Mb)
    Date
    4/16/1991
    Author
    Gaylord, Thomas K.
    Glytsis, Elias N.
    Moharam, Gamal M.
    Baird, William E.
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    Abstract
    A method of forming an antireflection rectangular-groove surface-relief grating on a lossy substrate exposed to incident waves of transverse electric or transverse magnetic or combination of polarizations and any angle of incidence in a lossless medium. The required thickness and complex refractive index of a single homogeneous layer on a lossy substrate to produce zero reflectivity is first computed using an impedance matching approach. The filling factor and groove depth of the rectangular groove surface-relief grating that is equivalent to the single homogeneous layer in the long-wavelength limit are then calculated. The surface-relief grating is then formed on the lossy substrate by reactive ion etching, electron beam lithography, or holography.
    URI
    http://hdl.handle.net/1853/56875
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    • Georgia Tech Patents [1761]

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