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    Photosensitive Sacrificial Polymer With Low Residue

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    8999629.pdf (854.6Kb)
    Date
    4/7/2015
    Author
    Kohl, Paul
    Chen, Yu-chun
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    Abstract
    Embodiments according to the present invention relate generally to PAG bilayer and PAG-doped unilayer structures using sacrificial polymer layers that incorporate a photoacid generator having a concentration gradient therein. Said PAG concentration being higher in a upper portion of such structures than in a lower portion thereof. Embodiments according to the present invention also relate to a method of using such bilayers and unilayers to form microelectronic structures having a three-dimensional space, and methods of decomposition of the sacrificial polymer within the aforementioned layers.
    URI
    http://hdl.handle.net/1853/56980
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