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    Method For The Combustion Chemical Vapor Deposition Of Films And Coatings

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    Date
    1/26/1999
    Author
    Hunt, Andrew T.
    Cochran, Joe K.
    Carter, William Brent
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    Abstract
    A method for applying coatings to substrates using combustion chemical vapor deposition by mixing together a reagent and a carrier solution to form a reagent mixture, igniting the reagent mixture to create a flame, or flowing the reagent mixture through a plasma torch, in which majority of the reagent is vaporized into a vapor phase, and contacting the vapor phase of the reagent to a substrate resulting in the deposition, at least in part from the vapor phase, of a coating of the reagent which can be controlled so as to have a preferred orientation on the substrate.
    URI
    http://hdl.handle.net/1853/57284
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    • Georgia Tech Patents [1761]

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