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dc.date.accessioned2017-05-12T14:28:10Z
dc.date.available2017-05-12T14:28:10Z
dc.date.issued3/21/2006
dc.identifier.urihttp://hdl.handle.net/1853/57610
dc.description.abstractIn a method of making graphite devices, a preselected crystal face of a crystal is annealed to create a thin-film graphitic layer disposed against selected face. A preselected pattern is generated on the thin-film graphitic layer. A functional structure includes a crystalline substrate having a preselected crystal face. A thin-film graphitic layer is disposed on the preselected crystal face. The thin-film graphitic layer is patterned so as to define at least one functional structure.
dc.titlePatterned Thin Film Graphite Devices And Method For Making Same
dc.typePatent
dc.contributor.patentcreatorDeheer, Walt A.
dc.contributor.patentcreatorBerger, Claire
dc.contributor.patentcreatorFirst, Phillip N.
dc.identifier.patentnumber7015142
dc.description.assigneeGeorgia Tech Research Corporation
dc.identifier.patentapplicationnumber10/860710
dc.date.filed6/3/2004
dc.identifier.uspc438/689
dc.identifier.cpcH01L21/0405
dc.identifier.cpcH01L21/0445
dc.identifier.cpcH01L29/16


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