Methods Of Forming Oxide Masks With Submicron Openings And Microstructures Formed Thereby
Anaraki, Siavash P.
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Processing techniques are disclosed for batch fabrication of microstructures comprising an oxide mask on a substrate with submicron openings formed therein, and microstructures having deep-submicron, high aspect-ratio etched trenches, using conventional optical photolithography. Exemplary high aspect-ratio etched-trench microstructures that may be produced include single crystal resonators and sensors.
- Georgia Tech Patents