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dc.date.accessioned2017-05-12T14:28:12Z
dc.date.available2017-05-12T14:28:12Z
dc.date.issued6/6/2006
dc.identifier.urihttp://hdl.handle.net/1853/57626
dc.description.abstractProcessing techniques are disclosed for batch fabrication of microstructures comprising an oxide mask on a substrate with submicron openings formed therein, and microstructures having deep-submicron, high aspect-ratio etched trenches, using conventional optical photolithography. Exemplary high aspect-ratio etched-trench microstructures that may be produced include single crystal resonators and sensors.
dc.titleMethods Of Forming Oxide Masks With Submicron Openings And Microstructures Formed Thereby
dc.typePatent
dc.contributor.patentcreatorAyazi, Farrokh
dc.contributor.patentcreatorAbdolvand, Reza
dc.contributor.patentcreatorAnaraki, Siavash P.
dc.identifier.patentnumber7056757
dc.description.assigneeGeorgia Tech Research Corporation
dc.identifier.patentapplicationnumber10/996683
dc.date.filed11/22/2004
dc.identifier.uspc438/48
dc.identifier.cpcB81C1/00619


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