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    Overlay Measurement Methods With Firat Based Probe Microscope

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    7461543.pdf (2.604Mb)
    Date
    12/9/2008
    Author
    Degertekin, Fahrettin Levent
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    Abstract
    A method, system and unit for determining alignment in a layered device such as a semiconductor device includes providing a first layer having detectable surface and subsurface material properties and positioning a patterned photoresist layer over the first layer, patterned photoresist layer having detectable surface and subsurface material properties. The layers are imaged with a FIRAT probe to detect the material properties, and the detectable material properties are compared for mapping an alignment of the compared detectable material properties. The first layer may be a substrate or have a previously processed layer formed thereon. A surface topography may be included over the substrate and an etchable layer formed over the substrate or first layer. The FIRAT probe may be a single tip probe or a dual tip probe.
    URI
    http://hdl.handle.net/1853/57773
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