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dc.date.accessioned2017-05-12T14:29:16Z
dc.date.available2017-05-12T14:29:16Z
dc.date.issued6/26/2012
dc.identifier.urihttp://hdl.handle.net/1853/58052
dc.description.abstractA system and method are provided for fabricating a low electric resistance ohmic contact, or interface, between a Carbon Nanotube (CNT) and a desired node on a substrate. In one embodiment, the CNT is a Multiwalled, or Multiwall, Carbon Nanotube (MWCNT), and the interface provides a low electric resistance ohmic contact between all conduction shells, or at least a majority of conduction shells, of the MWCNT and the desired node on the substrate. In one embodiment, a Focused Electron Beam Chemical Vapor Deposition (FEB-CVD) process is used to deposit an interface material near an exposed end of the MWCNT in such a manner that surface diffusion of precursor molecules used in the FEB-CVD process induces lateral spread of the deposited interface material into the exposed end of the MWCNT, thereby providing a contact to all conduction shells, or at least a majority of the conduction shells, of the MWCNT.
dc.titleElectron Beam Induced Deposition Of Interface To Carbon Nanotube
dc.typePatent
dc.contributor.patentcreatorFedorov, Andrei G.
dc.contributor.patentcreatorRykaczewski, Konrad
dc.identifier.patentnumber8207058
dc.description.assigneeGeorgia Tech Research Corporation
dc.identifier.patentapplicationnumber12/493278
dc.date.filed6/29/2009
dc.identifier.uspc438/618
dc.identifier.cpcH01L21/76838
dc.identifier.cpcB82Y40/00
dc.identifier.cpcH01L2221/1094


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