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    Methods And Systems For Metal-assisted Chemical Etching Of Substrates

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    Date
    10/2/2012
    Author
    Hildreth, Owen
    Wong, Ching Ping
    Xiu, Yonghao
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    Abstract
    Disclosed herein are various embodiments related to metal-assisted chemical etching of substrates on the micron, sub-micron and nano scales. In one embodiment, among others, a method for metal-assisted chemical etching includes providing a substrate; depositing a non-spherical metal catalyst on a surface of the substrate; etching the substrate by exposing the non-spherical metal catalyst and the substrate to an etchant solution including a composition of a fluoride etchant and an oxidizing agent; and removing the etched substrate from the etchant solution.
    URI
    http://hdl.handle.net/1853/58083
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