Positive-tone, Chemically Amplified, Aqueous-developable, Permanent Dielectric

Abstract

In microelectronic applications, it is often desired to deposit and pattern a permanent dielectric film in order to electrically and mechanically isolate components. Photo-patternable dielectrics are attractive for these uses because of their reduced time and cost requirements. These permanent dielectrics should be high-speed, positive-tone, and aqueous-developable. This type of patternability may be achieved by using a chemically amplified deprotection reaction of tert-butoxycarbonate or tert-butyl acrylate catalyzed by a photo-inducible acid. Provided herein are: a composition for preparing a dielectric film comprising a polymer mixture, wherein the polymer mixture comprises a base polymer comprising a pendent protected organic functionality, a photocatalyst for deprotecting the protected organic functionality and a chemical cross-linker for cross-linking the dielectric film after a photo-patterning has taken place in an aqueous solution; a dielectric film prepared from said composition; and method of preparing a dielectric film.